Electron Beam Lithography

Quantity :
Sample Price :
On Demand
Payment Terms :
Letter of Credit
Price Valid Till :
Dec,31, 2024

JBX-3200MV is a variable-shaped electron beam lithography system for mask making of 28 nm to 22/20 nm nodes. Its cutting-edge technology achieves high speed, high precision and high reliability. This EB system uses a variable-shaped 50 kV electron beam and a step-and-repeat specimen stage. Utilizing the merit of the step-and-repeat writing method, this EB system combines various functions such as the writing-dose modulation function and the overlay-writing function, thus making it possible to support versatile corrections required for patterning the next-generation masks and reticles.

Company Profile

Manufacturing, marketing, development & research of Sophisticated Scientific Instruments (Electron Optical Instrument, Analytical Instrument), Measuring Instruments, Semiconductor Equipment, Industrial Equipment, and Medical Equipment, processing, maintenance & services of related products and parts, as well as procurement & sales of peripherals